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It is a baking equipment for the liquid crystal manufacturing corresponding to
large size liquid crystal glass substrate (2500 x 2200) of the 8th generation.
It excelled in the temperature uniformity of the glass substrate heating,
and lightness, the thin type, and the enery saving were achived so far.
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Energy saving, lightness, and thin type hot plate for large size liquid crystal.
The temperature uniformity of the glass substrate heating improves moreover!
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Glass substrate heating [°C] |
Temperature range [°C] |
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60
~ 80 |
R<1.2 |
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80.1~100 |
R<1.5 |
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100.1~130 |
R<2.0 |
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130.1~150 |
R<2.5 |
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150.1~180 |
R<3.0 |
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A large size hot plate is made efficient by polytomy zone control.
Please refer to the page of "Hot plate" for details of the hot plate used.
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